Sputter Coater Device - High Vacuum - Single Cathode - Model: DST1 - NSC Company Buy Wholesale Price | Zoodel Wholesale Marketplace
Sputter Coater Device - High Vacuum - Single Cathode - Model: DST1 - NSC Company
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Product Details

  • 90129000
  • DST1
  • NSC
  • Iran
  • High vacuum turbo pump (German)
  • Diaphragm backing pump (German)
  • Full range vacuum gauge
  • Less than 2x10-6 torr
  • High precision quartz crystal thickness monitoring
  • Intuitive touch screen to control the coating process and rapid data input
  • Equipped to electronic shutter
  • 28kg
  • 60 kg
  • Two-year warranty
  • All ports
  • 2 months
  • Each device placed in a wheeled aluminum box and pump is individually packaged in a carton. all packaging is according to international transportation standards


The magnetron desk sputter coater model DST1 is a compact coating system able to coat semiconductors, dielectrics and metals (oxidizing and non-oxidizing). Uniform thin films with fine-grain sizes are formed in a fast cycle time.

The DST1 is equipped with a magnetron cathode. Diameter of the cathode depending on the requirement could be 2 or 4 inches.

DST1 - 2

The DST1-2 is configured as a sputter coater and fiber carbon coater (optional) with interchangeable heads in one instrument suitable for Scanning Electron Microscope (SEM) sample preparation.

This high vacuum coater offers high quality uniform films with fine grain sizes which are suitable for specimens that require high resolution and high quality characterization such as FE-SEM, EDS/WDS, TEM, and EBSD.


The DST1-2 with a 2 inches magnetron cathode, 300 W RF power supply (optional) with matching box, 80 W switching DC power supply and high current power supply for carbon evaporation (optional), could be used for research and different thin film applications.

DST1 – 4

The Large chamber DST1-4 with a 4 inches, water-cooled, magnetron cathode is ideally suited for coating the large specimens with diameter up to 15 Cm or multiple smaller specimens over a similar diameter.

The unlimited sputtering time makes it suitable for deposition of thick layers.

The system is equipped with 800 W DC power supply, 300 W RF power supply (optional) with matching box and could deposit a wide range of material on different surfaces for thin film applications, micro & nano electronic and SEM sample preparation.


  • Carbon fiber evaporation (DST1-2).

  • Pulsed or flash carbon fiber coating modes (DST1-2).

  • Control coating rate to achieve finer grain structures.

  • Manual or automatic Timed and Thickness sputtering.

  • Able to record and plot coating parameters graphs.

  • Easy-to-change specimen stages (rotation stage as standard).

  • Control the rate of sputtering to achieve finer grain structure.

  • Automatically controlled the power of sputtering independent of pressure.

  • Precision Mass Flow meter (MFC) in order to fine control of the vacuum pressure

  • Able to record and plot coating parameters graphs.

  • Transfer the curves and deposition process data by USB port to PC.

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