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Tabletop Sputter Coater - Tavana Lab
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Product Details

  • Tavana Lab.
  • Iran
  • Rotary vane, two-stage, direct drive, 170 L/m
  • Less than 30 millitorr
  • 0-100 mA, DC 800 V, 50 Hz
  • ¼ inch
  • 2 inch
  • Coating the non-conductive materials with nanofilms of the noble metals; Sample preparation for SEM
  • Touchscreen and colorful display; Thickness monitoring system for thickness measurement; Manual and automatic sputtering regarding time and thickness; Able to draw graphs of sputtering parameters; USB port

Description

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. This process is commonly utilized for thin-film deposition, etching and analytical techniques.

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